|
|
Volumn , Issue , 2005, Pages 129-133
|
|
Manufacturability comparison of thin oxynitride films
a
a
IBM
(United States)
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
ANALYTICAL RESULTS;
CONTROL METHODS;
ELECTRICAL PERFORMANCES;
LINE WIDTHS;
MANUFACTURABILITY;
OXYNITRIDE FILMS;
PROCESS CAPABILITIES;
SEMICONDUCTOR PROCESSING;
TOFSIMS;
TOOL MATCHING;
WAFER PROCESSING;
CRYSTALS;
ELECTRIC CONDUCTIVITY;
INTERNET PROTOCOLS;
NITRIDES;
PHOTOELECTRON SPECTROSCOPY;
RAPID THERMAL ANNEALING;
SEMICONDUCTOR MATERIALS;
X RAY PHOTOELECTRON SPECTROSCOPY;
|
|
EID: 45749100379
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/RTP.2005.1613694 Document Type: Conference Paper |
|
Times cited : (1)
|
|
References (0)
|
