Emissivity-independent rapid thermal processing using radiation shields

Materials Research Society Symposium - Proceedings

Volumn 470, Issue , 1997, Pages 57-62

  Timans, P J ^a   Morishige, R N ^a   Wasserman, Y ^a  

^a AG Associates Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HEAT RADIATION; LIGHT EMISSION; PYROMETERS; RADIATION SHIELDING; TEMPERATURE CONTROL; THERMOCOUPLES;

RAPID THERMAL PROCESSING;

SILICON WAFERS;

EID: 0031333537     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-470-57     Document Type: Conference Paper

References (7)