Characterization of low-order aberrations in the SEMATECH Albany MET tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Naulleau, Patrick ^a,b   Waterman, Justin ^a   Dean, Kim ^c  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c SEMATECH   (United States)

Author keywords

Aberrations; Extreme ultraviolet; Lithography

Indexed keywords

ABERRATION MEASUREMENTS; MICROFIELD EXPOSURE TOOL (MET);

ABERRATIONS; INTEGRATED OPTICS; INTERFEROMETERS; MICROOPTICS; OPTICAL VARIABLES MEASUREMENT;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148819703     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.713448     Document Type: Conference Paper

References (14)

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8. K. Goldberg, P. Naulleau, P. Denham, S. Rekawa, K. Jackson, E. Anderson and J. Liddle, "At-Wavelength Alignment and Testing of the 0.3 NA MET Optic," J. Vac. Sci. & Technol. B 22, 2956-2961 (2004).
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11. Wavefront data provided by Erik Sohmen, Carl Zeiss SMT AG, Oberkochen, Germany.
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