General imaging of advanced 3D mask objects based on the fully-vectorial Extended Nijboer-Zernike (ENZ) theory

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Van Haver, Sven ^a   Janssen, Olaf T A ^a   Braat, Joseph J M ^a   Janssen, Augustus J E M ^b   Urbach, H Paul ^a   Pereira, Silvania F ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

Abbe method; Extended Nijboer Zernike (ENZ); FDTD; Mask imaging; Mask topography effects; Non periodic objects; Vectorial

Indexed keywords

ALGORITHMS; EVOLUTIONARY ALGORITHMS; LITHOGRAPHY; PAPER; SCHEDULING ALGORITHMS; STRUCTURAL ANALYSIS; THREE DIMENSIONAL;

(E ,2E) THEORY; GENERAL (CO); HOPKINS; IMAGE FORMATIONS; IMAGING ALGORITHMS; IMAGING FEATURES; INTEGRATION METHODS; ISOLATED STRUCTURES; MASK TOPOGRAPHY; NEW METHODS; OPTICAL MICRO LITHOGRAPHY; SIMULATION RESULTS; SOURCE POINTS; ZERNIKE;

BOOLEAN FUNCTIONS;

EID: 45449095695     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771872     Document Type: Conference Paper

References (22)

1. A. K. Wong, Resolution enhancement techniques in optical lithography, Bellingham: SPIE Press, 2001, Tutorial texts in optical engineering Vol. TT47, 2001.
2. A. K. Wong, Optical imaging in projection microlithography, Bellingham: SPIE Press, 2005, Tutorial texts in optical engineering Vol. TT66, 2005.
3. H. H. Hopkins, "On the Diffraction Theory of Optical Images," Proc. Roy. Soc. A 217, pp. 408-432, May 1953.
4. A. J. E. M. Janssen, "Extended Nijboer-Zernike approach for the computation of optical point-spread functions," J. Opt. Soc. Am. A 19, pp. 849-857, May 2002.
5. J. J. M. Braat, P. Dirksen, and A. J. E. M. Janssen, "Assessment of an extended Nijboer-Zernike approach for the computation of optical point-spread functions," J. Opt. Soc. Am. A 19, pp. 858-870, May 2002.
6. P. Dirksen, J. J. M. Braat, A. J. E. M. Janssen, A. Leeuwestein, T. Matsuyama, and T. Noda, "Aerial image based lens metrology for wafer steppers," in Proceedings of the SPIE, Vol., 6154, pp. 331-341, Apr. 2006.
7. M. Born and E. Wolf, Principles of optics. Electromagnetic theory of propagation, interference and diffraction of light, Oxford: Pergamon Press, 1980, 6th corrected ed., 1980.
8. O. T. A. Janssen, S. van Haver, A. J. E. M. Janssen, J. J. M. Braat, H. P. Urbach, and S. F. Pereira, "Extended Nijboer-Zernike (ENZ) based mask imaging: Efficient coupling of electromagnetic field solvers and the ENZ imaging algorithm," in Proceedings of the SPIE, Vol., 6924, Feb. 2008.
9. J. J. M. Braat, P. Dirksen, A. J. E. M. Janssen, and A. S. van de Nes, "Extended Nijboer-Zernike representation of the vector field in the focal region of an aberrated high-aperture optical system," J. Opt. Soc. Am. A 20, pp. 2281-2292, Dec. 2003.
10. J. J. M. Braat, P. Dirksen, A. J. E. M. Janssen, S. van Haver, and A. S. van de Nes, "Extended Nijboer-Zernike approach to aberration and birefringence retrieval in a high-numerical-aperture optical system," J. Opt. Soc. Am. A 22, pp. 2635-2650, Dec. 2005.
11. S. van Haver, J. J. M. Braat, P. Dirksen, and A. J. E. M. Janssen, "High-NA aberration retrieval with the extended Nijboer-Zernike vector diffraction theory," Journal of the European Optical Society - Rapid publications, vol. 1 06004 1, June 2006.
12. B. Richards and E. Wolf, "Electromagnetic Diffraction in Optical Systems. II. Structure of the Image Field in an Aplanatic System," Proc. Roy. Soc. A 253, pp. 358-379, Dec. 1959.
13. A. Erdmann, G. Citarella, P. Evanschitzky, H. Schermer, V. Philipsen, and P. De Bisschop, "Validity of the Hopkins approximation in simulations of hyper-NA (NA> 1) line-space structures for an attenuated PSM mask," in Proceedings of the SPIE, Vol., 6154, pp. 167-178, Apr. 2006.
14. A. Erdmann, P. Evanschitzky, and P. De Bisschop, "Mask and wafer topography effects in immersion lithography," in Proceedings of the SPIE, Vol., 5754, pp. 383-394, May 2005.
15. M. D. Smith, T. Graves, J. D. Byers, and C. A. Mack, "The impact of mask topography on binary reticles at the 65nm node," in Proceedings of the SPIE, Vol., 5754, pp. 527-536, May 2005.
16. J. Ruoff, J. T. Neumann, E. Schmitt-Weaver, E. van Setten, N. Ie Masson, C. Progler, and B. Geh, "Polarization-induced astigmatism caused by topographic masks," in Proceedings of the SPIE, Vol., 6730, Oct. 2007.
17. J. Tirapu-Azpiroz and E. Yablonovitch, "Incorporating mask topography edge diffraction in photolithography simulations," J. Opt. Soc. Am. A 23, pp. 821-828, Apr. 2006.
18. Y. Inazuki, N. Toyama, T. Adachi, T. Nagai, T. Suto, Y. Morikawa, H. Mohri, and N. Hayashi, "Analysis of diffraction orders including mask topography effects for OPC optimization," in Proceedings of the SPIE, Vol., 6520, Mar. 2007.
19. Q. Yan, Z. Deng, and J. Shiely, "Fast synthesis of topographic mask effects based on rigorous solutions," in Proceedings of the SPIE, Vol., 6730, Oct. 2007.
20. Y. Aksenov, P. Zandbergen, and M. Yoshizawa, "Compensation of high-NA mask topography effects by using object modified Kirchhoff model for 65 and 45nm nodes," in Proceedings of the SPIE, Vol., 6154, pp. 513-522, Apr. 2006.
21. M. S. Yeung, D. Lee, R. Lee, and A. R. Neureuther, "Extension of the Hopkins theory of partially coherent imaging to include thin-film interference effects," in Proceedings of the SPIE, Vol., 1927, pp. 452-463, Aug. 1993.
22. D. G. Flagello, T. Milster, and A. E. Rosenbluth, "Theory of high-NA imaging in homogeneous thin films," J. Opt. Soc. Am. A 13, pp. 53-64, Jan. 1996.