Compensation of high-NA mask topography effects by using object modified Kirchhoff model for 65 and 45nm nodes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Aksenov, Yuri ^a   Zandbergen, Peter ^a   Yoshizawa, Masaki ^b  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b SONY CORPORATION   (Japan)

Author keywords

High NA; Mask topography; OPC; Optical lithography; Polarization

Indexed keywords

DIFFRACTION; IMAGING TECHNIQUES; PHOTOLITHOGRAPHY; POLARIZATION;

HIGH NA; MASK TOPOGRAPHY; OPC; SCALAR DIFFRACTION MODEL;

MASKS;

EID: 33745780295     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.659345     Document Type: Conference Paper

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