The impact of mask topography on binary reticles at the 65nm node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 527-536

  Smith, Mark D ^a,b   Graves, Trey ^a   Byers, Jeffrey D ^a   Mack, Chris A ^a  

^a KLA TENCOR CORPORATION   (United States)

^b NONE   (United States)

Author keywords

Kirchhoff approximation; Mask simulation; Maxwell equations; PROLITH; Thin mask approximation

Indexed keywords

APPROXIMATION THEORY; ATTENUATION; COMPUTER SIMULATION; COMPUTER SOFTWARE; MAXWELL EQUATIONS; PHASE SHIFT;

KIRCHHOFF APPROXIMATION; MASK SIMULATION; PROLITH; THIN-MASK APPROXIMATION;

MASKS;

EID: 25144500473     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601523     Document Type: Conference Paper

References (0)