Analysis of diffraction orders including mask topography effects for OPC optimization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 3, 2007, Pages

  Inazuki, Yuichi ^a   Toyama, Nobuhito ^a   Adachi, Takashi ^a   Nagai, Takaharu ^a   Suto, Takanori ^a   Morikawa, Yasutaka ^a   Mohri, Hiroshi ^a   Hayashi, Naoya ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Compensation; Diffraction orders; Hyper NA; OPC; Rigorous simulation

Indexed keywords

APPROXIMATION THEORY; ASPECT RATIO; COMPUTER SIMULATION; DIFFRACTION; OPTIMIZATION; TOPOGRAPHY;

COMPUTATION TIME; DIFFRACTION ORDERS; HYPER NA; RIGOROUS SIMULATION;

PHOTOMASKS;

EID: 35148845613     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711757     Document Type: Conference Paper

References (6)

1. 1 and Ultrahigh NA Regime: Phase and Polarization Effects", Proc. EMLC Vol. 5835, p.69, (2004)
2. Y. Aksenov et al., "Compensation of high-NA mask topography effects by using object modified Kirchhoff model for 65and 45nm nodes", Proc. SPIE Vol. 6154, 61541H, (2006)
3. S. Tanaka et al., "Evaluation of Extendibility for Fourier Diffraction Theory for Topographical Mask Structure under Hyper NA Lithography", Proc. SPIE Vol. 5754, p.942, (2005)
4. J. Cobb et al., "The impact of mask topography on CD control", Proc. SPIE Vol. 5754, p.395, (2005)
5. T. Adachi, et al., "45-32nm node photomask technology with water immersion lithography", Proc. SPIE Vol. 6349, 63493J, (2006)
6. T. Suto, et al., "Diffraction efficiency analysis on AIMS™ 45-193i for advanced photomasks", 3rd International Symposium on Immersion Lithography, Oct. 2006