The role of the methyl and hydroxyl groups of low- k dielectric films on the nucleation of ruthenium by ALD

Electrochemical and Solid-State Letters

Volumn 11, Issue 8, 2008, Pages

  Heo, Jaeyeong ^a   Won, Seok Jun ^a,b   Eom, Dail ^a   Lee, Sang Young ^a   Ahn, Young Bae ^a   Hwang, Cheol Seong ^a,c   Kim, Hyeong Joon ^a,c  

^a Seoul National University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; AROMATIC COMPOUNDS; CHARGED PARTICLES; DIELECTRIC FILMS; ELECTRONS; EPITAXIAL GROWTH; FUNCTIONAL GROUPS; HYDROCARBONS; NUCLEATION; PHYSICAL VAPOR DEPOSITION; PULSED LASER DEPOSITION; RUTHENIUM; SPECTROSCOPIC ANALYSIS; SURFACES; THIN FILMS;

ATOMIC LAYER DEPOSITION (ATL); CONCENTRATION (COMPOSITION); ELECTROCHEMICAL SOCIETY (ECS); ELECTRON DEFICIENT; ELECTRON-RICH; HYDROXYL GROUPS; LOW K FILMS; LOW-K DIELECTRIC FILMS; METHYL GROUPS; PREFERENTIAL ADSORPTION; SILYLATION;

ATOMIC LAYER DEPOSITION;

EID: 45249112135     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2929064     Document Type: Article

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