Optical topography measurement of patterned wafers

AIP Conference Proceedings

Volumn 788, Issue , 2005, Pages 432-436

  De Lega, Xavier Colonna ^a   De Groot, Peter ^a  

^a ZYGO CORPORATION   (United States)

Author keywords

Interference Microscopy; Patterned Wafer; Surface Topography

Indexed keywords

EID: 33749664938     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2062999     Document Type: Conference Paper

References (12)

1. M. Davidson, K. Kaufman, I. Mazor, and F. Cohen, "An Application of Interference Microscopy to Integrated Circuit Inspection and Metrology", Proceedings SPIE 775, Integrated circuit metrology, inspection and process control, 233-247 (1987).
2. G. S. Kino and S. S. C. Chim, "Mirau correlation microscope," Appl. Opt. 29(26), 3775-3783 (1990).
3. P. de Groot, "Method and apparatus for surface topography measurement by spatial-frequency analysis of interferograms," U.S. patent 5,398,113,14 Mar. 1995.
4. Peter de Groot, Xavier Colonna de Lega, "Signal Modeling for Low-Coherence Height-Scanning Interference Microscopy," Appl. Opt. 43(25), 4821-4830 (2004).
5. P. de Groot and X. Colonna de Lega, "Signal modeling for modern interference microscopes," Proc. SPIE 5457, 26-34 (2004).
6. M. Born and E. Wolf, Sections 1.5 and 1.6, in Principles of Optics, 7th ed., Cambridge: Cambridge University Press, 1999, pp. 38-74.
7. S. W. Kim and G. H. Kim, "Method for measuring a thickness profile and a refractive index using white-light scanning interferometry and recording medium therefore," US Patent 6,545,763B1 (Apr. 8,2003).
8. S.-W. Kim and G.-H. Kim, "Thickness-profile measurement of transparent thin-film layers by white-light scanning interferometry," Appl. Opt. 38(28), 5968-5973 (1999).
9. These classes of techniques are covered by published patent applications 20040085544 and 20040189999, assigned to Zygo Corporation.
10. C. M. Herzinger, B. Johs, W. A. McGahan, J. A. Woollam, W. Paulson, "Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation," J. Appl. Phys. 83(6), 3323-3336 (1998).
11. H. R. Philipp, "Silicon Nitride (Noncrystalline)," in Handbook of Optical Constants of Solids, edited by E. D. Palik, Academic Press, 1985, pp. 771-774.
12. 4 can vary by as much as 0.02 at visible wavelengths.