SCOPUS 정보 검색 플랫폼

Applied Surface Science

Volumn 254, Issue 19, 2008, Pages 6208-6210

Low-temperature formation of silicon nitride films using pulsed-plasma CVD under near atmospheric pressure

(8) Matsumoto, M a Inayoshi, Y a Suemitsu, M a Miyamoto, E b Yara, T b Nakajima, S b Uehara, T b Toyoshima, Y c

a TOHOKU UNIVERSITY (Japan)

b SEKISUI CHEMICAL CO LTD (Japan)

c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

Atmospheric pressure; PECVD; Polyethylene terephthalate; Silicon nitride

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; DEPOSITION RATES; ELECTRIC DISCHARGES; INERT GASES; NITRIDES; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASTIC BOTTLES; POLYETHYLENE TEREPHTHALATES; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE; SUBSTRATES; TEMPERATURE;

ATMOSPHERIC PRESSURE PLASMAS; DEPOSITED FILMS; FILM FABRICATION; HIGH DEPOSITION RATES; LOW TEMPERATURE FORMATION; LOW TEMPERATURES; POLYETHYLENE TEREPHTHALATES (PET); SILICON NITRIDE FILM;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 45049084981 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2008.02.186 Document Type: Article

Times cited : (7)

References (12)

1
- 33947659598
- Cherenack K., Kattamis A., Long K., Cheng I.-C., Wagner S., and Sturm J.-C. Mater. Res. Soc. Symp. Proc. 936 (2006) L01-L05
- (2006) Mater. Res. Soc. Symp. Proc. , vol.936
- Cherenack, K.¹ Kattamis, A.² Long, K.³ Cheng, I.-C.⁴ Wagner, S.⁵ Sturm, J.-C.⁶

2
- 0038485908
- Holt J.K., Goodwin D.G., Gabor A.M., Jiang F., Stavola M., and Atwater H.A. Thin Solid Films 430 (2003) 37
- (2003) Thin Solid Films , vol.430 , pp. 37
- Holt, J.K.¹ Goodwin, D.G.² Gabor, A.M.³ Jiang, F.⁴ Stavola, M.⁵ Atwater, H.A.⁶

3
- 32644436297
- Masuda A., Umemoto H., and Matsumura H. Thin Solid Films 501 (2006) 149
- (2006) Thin Solid Films , vol.501 , pp. 149
- Masuda, A.¹ Umemoto, H.² Matsumura, H.³

4
- 0035247904
- Flewitt A.J., Dyson A.P., Robertson J., and Milne W.I. Thin Solid Films 383 (2001) 172
- (2001) Thin Solid Films , vol.383 , pp. 172
- Flewitt, A.J.¹ Dyson, A.P.² Robertson, J.³ Milne, W.I.⁴

5
- 33750510062
- Sancho-Parramon J., Bosch S., and Canillas A. Appl. Surf. Sci. 253 (2006) 65
- (2006) Appl. Surf. Sci. , vol.253 , pp. 65
- Sancho-Parramon, J.¹ Bosch, S.² Canillas, A.³

6
- 34748888489
- Karunagaran B., Chung S.J., Velumani S., and Suh E.-K. Mater. Chem. Phys. 106 (2007) 130
- (2007) Mater. Chem. Phys. , vol.106 , pp. 130
- Karunagaran, B.¹ Chung, S.J.² Velumani, S.³ Suh, E.-K.⁴

7
- 0036721756
- Chang K.M., Cheng C.C., and Lang C.C. Solid-State Electron. 46 (2002) 1399
- (2002) Solid-State Electron. , vol.46 , pp. 1399
- Chang, K.M.¹ Cheng, C.C.² Lang, C.C.³

8
- 15444371464
- Kim Y.T., Kim D.S., and Yoon D.H. Mater. Sci. Eng. B 118 (2005) 242
- (2005) Mater. Sci. Eng. B , vol.118 , pp. 242
- Kim, Y.T.¹ Kim, D.S.² Yoon, D.H.³

9
- 24044449674
- Kitabatake H., Suemitsu M., Kitahata H., Nakajima S., Uehara T., and Toyoshima Y. Jpn. J. Appl. Phys. 44 (2005) L683
- (2005) Jpn. J. Appl. Phys. , vol.44
- Kitabatake, H.¹ Suemitsu, M.² Kitahata, H.³ Nakajima, S.⁴ Uehara, T.⁵ Toyoshima, Y.⁶

10
- 33846957171
- Matsumoto M., Suemitsu M., Yara T., Nakajima S., Uehara T., Toyoshima Y., and Itou S. ECS Trans. 3 (2006) 119
- (2006) ECS Trans. , vol.3 , pp. 119
- Matsumoto, M.¹ Suemitsu, M.² Yara, T.³ Nakajima, S.⁴ Uehara, T.⁵ Toyoshima, Y.⁶ Itou, S.⁷

11
- 0000985289
- Peden C.H.F., Rogers J.W., Shinn N.D., Kidd K.B., and Tsang K.L. Phys. Rev. B 47 (1993) 15622
- (1993) Phys. Rev. B , vol.47 , pp. 15622
- Peden, C.H.F.¹ Rogers, J.W.² Shinn, N.D.³ Kidd, K.B.⁴ Tsang, K.L.⁵

12
- 27844544730
- Jacobsohn L.G., Schulze R.K., Daemen L.L., Afanasyev-Charkin I.V., and Nastasi M. Thin Solid Films 494 (2006) 219
- (2006) Thin Solid Films , vol.494 , pp. 219
- Jacobsohn, L.G.¹ Schulze, R.K.² Daemen, L.L.³ Afanasyev-Charkin, I.V.⁴ Nastasi, M.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.