Chemical bonding investigation of amorphous hydrogenated Si-N alloys deposited by plasma immersion ion processing

Thin Solid Films

Volumn 494, Issue 1-2, 2006, Pages 219-222

  Jacobsohn, L G ^a   Schulze, R K ^a   Daemen, L L ^a   Afanasyev Charkin, I V ^a   Nastasi, M ^a  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

Chemical bonding; Silicon nitride; X ray photoelectron microscopy

Indexed keywords

CHEMICAL BONDS; HYDROGENATION; RAMAN SPECTROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON ALLOYS; SILICON NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL BONDING; ELASTIC RECOIL DETECTION (ERD) ANALYSIS; PLASMA IMMERSION ION PROCESSING;

AMORPHOUS ALLOYS;

EID: 27844544730     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.166     Document Type: Conference Paper

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