Study and comparison of deposition rates, grain size of Ag and Cu thin films with respect to sputtering parameters, and annealing temperature

Journal of Physics: Conference Series

Volumn 61, Issue 1, 2007, Pages 1322-1325

  Zendehnam, A ^a   Ghanati, M ^b   Mirzaei, M ^b  

^a ARAK UNIVERSITY   (Iran)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 34247536376     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/61/1/261     Document Type: Article

References (6)

1. Jenkins F A and White H E 1976 Fundamental of optics ((International student edn))
2. Chopra 1993 thin film phenomena (Chairman Press) p 20-26
3. Raymond Eller Kirk, Donald Frederick Othmer, Martin Grayson and David Eckroth 1979 Kirk-Othmer Encyclopedia of chemical technology vol 6 3rd edn p 826
4. Kundu S et al 1998 Morphology of thin silver film grown by DC sputtering on Si (001) J. Phys. D. Appl. Phys. 31 L73-L77
5. Eckertova L 1990 Physics of thin films 2nd edn (Charles university, Prague)
6. Hoffman D W and J A Thornton 1979 J. Vac. Sci. Technol. 16 134