Structural, electrical and optical properties of indium tin oxide films prepared by low-energy oxygen-ion-beam assisted deposition

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 348-352

  Liu, C ^a,b   Matsutani, T ^a   Asanuma, T ^a   Kiuchi, M ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b WUHAN UNIVERSITY   (China)

Author keywords

Electron cyclotron resonance; Indium tin oxide; Ion beam assisted deposition

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON CYCLOTRON RESONANCE; ION BEAM ASSISTED DEPOSITION; ION BOMBARDMENT; LIGHT TRANSMISSION; SEMICONDUCTING INDIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

MICROSLIDE GLASSES;

SEMICONDUCTING FILMS;

EID: 0037809187     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00760-2     Document Type: Conference Paper

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