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Volumn 38, Issue 6, 1999, Pages 953-957

Transparent indium tin oxide films prepared by ion-assisted deposition with a single-layer overcoat

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; DEPOSITION; DIFFUSION IN SOLIDS; ELECTRON BEAMS; ELECTRON GUNS; INDIUM COMPOUNDS; ION BOMBARDMENT; ION SOURCES; OPTICAL COATINGS; SECONDARY ION MASS SPECTROMETRY; SURFACE ROUGHNESS;

EID: 0032623698     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.602135     Document Type: Article
Times cited : (23)

References (14)
  • 1
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    • H. L. Ma, D. H. Zhang, P. Ma, S. Z. Win, and S. Y. Li, "Preparation and properties of transparent conductive indium tin oxide films deposited by reactive evaporation," Thin Solid Films 263, 105 (1995).
    • (1995) Thin Solid Films , vol.263 , pp. 105
    • Ma, H.L.1    Zhang, D.H.2    Ma, P.3    Win, S.Z.4    Li, S.Y.5
  • 2
    • 0025521833 scopus 로고
    • Electrical and optical properties of vacuum-evaporated indium-tin oxide films with high electron mobility
    • T. Nagatoma, Y. Maruta, and O. Omoto, "Electrical and optical properties of vacuum-evaporated indium-tin oxide films with high electron mobility," Thin Solid Films 192, 17-25 (1990).
    • (1990) Thin Solid Films , vol.192 , pp. 17-25
    • Nagatoma, T.1    Maruta, Y.2    Omoto, O.3
  • 3
    • 0029247155 scopus 로고
    • Characteristics of indium tin oxide films deposited rf magnetron sputtering
    • R. N. Joshi, V. P. Singh, and J. C. McClure, "Characteristics of indium tin oxide films deposited rf magnetron sputtering," Thin Solid Films 257, 32 (1995).
    • (1995) Thin Solid Films , vol.257 , pp. 32
    • Joshi, R.N.1    Singh, V.P.2    McClure, J.C.3
  • 4
    • 34247097777 scopus 로고
    • Effect of oxygen partial pressure on the microstructure and electric properties of indium tin oxide film prepared by dc magnetron sputtering
    • C. G. Choi, K. No, W. S. Lee, H. G. Kim, S. O. Jung, W. J. Lee, W. S. Kim, S. J. Kim, and C. Yoon, "Effect of oxygen partial pressure on the microstructure and electric properties of indium tin oxide film prepared by dc magnetron sputtering," Thin Solid Films 258, 274 (1995).
    • (1995) Thin Solid Films , vol.258 , pp. 274
    • Choi, C.G.1    No, K.2    Lee, W.S.3    Kim, H.G.4    Jung, S.O.5    Lee, W.J.6    Kim, W.S.7    Kim, S.J.8    Yoon, C.9
  • 6
    • 0026222896 scopus 로고
    • Sol-gel derived, air-baked indium and tin oxide films
    • D. M. Mattox, "Sol-gel derived, air-baked indium and tin oxide films," Thin Solid Films 204, 25-32 (1991).
    • (1991) Thin Solid Films , vol.204 , pp. 25-32
    • Mattox, D.M.1
  • 7
    • 0026204205 scopus 로고
    • Indium tin oxide thin films prepared by chemical vapour deposition
    • T. Maruyama and K. Fukui, "Indium tin oxide thin films prepared by chemical vapour deposition," Thin Solid Films 203, 297-302 (1991).
    • (1991) Thin Solid Films , vol.203 , pp. 297-302
    • Maruyama, T.1    Fukui, K.2
  • 8
    • 0022689878 scopus 로고
    • Properties of indium tin oxide films prepared by ion-assisted deposition
    • P. J. Martin and R. P. Netterfield, "Properties of indium tin oxide films prepared by ion-assisted deposition," Thin Solid Films 137, 207-214 (1986).
    • (1986) Thin Solid Films , vol.137 , pp. 207-214
    • Martin, P.J.1    Netterfield, R.P.2
  • 9
    • 84975661829 scopus 로고
    • Transparent, conducting indium tin oxide films formed on low or medium temperature substrates by ion-assisted deposition
    • J. A. Dobrowolski, F. C. Ho, D. Menagn, R. Simoson, and A. Waldorf, "Transparent, conducting indium tin oxide films formed on low or medium temperature substrates by ion-assisted deposition," Appl. Opt. 26, 5204-5210 (1987).
    • (1987) Appl. Opt. , vol.26 , pp. 5204-5210
    • Dobrowolski, J.A.1    Ho, F.C.2    Menagn, D.3    Simoson, R.4    Waldorf, A.5
  • 10
    • 0001134665 scopus 로고
    • Transparent conductive indium oxide film on low temperature substrates by activated reactive evaporation
    • O. Marcovitch, Z. Klein, and I. Lubezky, "Transparent conductive indium oxide film on low temperature substrates by activated reactive evaporation," Appl. Opt. 28, 2792-2795 (1989).
    • (1989) Appl. Opt. , vol.28 , pp. 2792-2795
    • Marcovitch, O.1    Klein, Z.2    Lubezky, I.3
  • 11
    • 85076488019 scopus 로고
    • Application of ion-assisted-deposition using a gridless end-Hall ion source for volume manufacturing of thin-film optical filters
    • Int. Symp. on Optical Interference Coating, Grenoble, France
    • M. L. Fulton, "Application of ion-assisted-deposition using a gridless end-Hall ion source for volume manufacturing of thin-film optical filters," Int. Symp. on Optical Interference Coating, Grenoble, France, Proc. SPIE 2253, 374-393 (1994).
    • (1994) Proc. SPIE , vol.2253 , pp. 374-393
    • Fulton, M.L.1
  • 12
    • 0002915590 scopus 로고
    • Transparent conductive films
    • J. L. Vossen, "Transparent conductive films," Phys. Thin Films 9, 1 (1977).
    • (1977) Phys. Thin Films , vol.9 , pp. 1
    • Vossen, J.L.1
  • 13
    • 0021097455 scopus 로고
    • Transparent conductors - A status review
    • K. L. Chopra, S. Major, and D. K. Pandya, "Transparent conductors - a status review," Thin Solid Films 102, 1-46 (1983).
    • (1983) Thin Solid Films , vol.102 , pp. 1-46
    • Chopra, K.L.1    Major, S.2    Pandya, D.K.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.