Transmission electron microscopy characterization of HfO 2/GaAs(001) heterostructures grown by molecular beam epitaxy

Applied Physics A: Materials Science and Processing

Volumn 91, Issue 4, 2008, Pages 585-589

  Liou, S C ^a   Chu, M W ^a   Chen, C H ^a   Lee, Y J ^b   Chang, P ^b   Lee, W C ^b   Hong, M ^b   Kwo, J ^b  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; FILM THICKNESS; HAFNIUM COMPOUNDS; MOLECULAR BEAM EPITAXY; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR GROWTH; TRANSMISSION ELECTRON MICROSCOPY;

ANTI-PHASE BOUNDARIES; C-ORIENTED EPITAXY;

HETEROJUNCTIONS;

EID: 43449110706     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-008-4493-3     Document Type: Article

References (26)

1. J. Wang, H.P. Li, R. Stevens, J. Mater. Sci. 47, 463 (2002)
2. A.J. Waldorf, J.A. Dobrowolski, B.T. Sullivan, L.M. Plante, Appl. Opt. 32, 5583 (1993)
3. P.S. Priambodo, T.A. Maldonado, R. Magnusson, Appl. Phys. Lett. 83, 3248 (2003)
4. X. Zhao, D. Vanderbilt, Phys. Rev. B 65, 233106 (2002)
5. M. Balog, M. Schieber, M. Michman, S. Patai, Thin Solid Films 41, 247 (1977)
6. K.J. Hubbard, D.G. Schlom, J. Mater. Res. 11, 2757 (1996)
7. S. Koveshnikov, W. Tsau, I. Ok, J.C. Lee, V. Torkanov, M. Yakimov, S. Oktyabrsky, Appl. Phys. Lett. 88, 022106 (2006)
8. S.J. Koester, E.W. Kiewra, Y. Sun, D.A. Neumayer, J.A. Ott, M. Copel, D.K. Sadana, D.J. Wedd, J. Fompeyrine, J.P. Locquet, C. Marchiori, M. Sousa, R. Germann, Appl. Phys. Lett. 89, 042104 (2006)
9. H.B. Park, M. Cho, J. Park, S.W. Lee, C.S. Hwang, J. Appl. Phys. 94, 3641 (2003)
10. F. Cardarelli, Materials Handbook (Springer, London, 2000)
11. O. Ohtaka, T. Yamanaka, S. Kume, N. Hara, H. Asano, F. Izumi, J. Am. Ceram. Soc. 78, 233 (1995)
12. J. Aarik, A. Aidla, A.-A. Kiisler, T. Uustare, V. Sammelselg, Thin Solid Films 340, 110 (1999)
13. C.-H. Hsu, P. Chang, Z.K. Yang, Y.J. Lee, M. Hong, J. Kwo, C.M. Huang, H.Y. Lee, Appl. Phys. Lett. 89, 122907 (2006)
14. Z.K. Yang, W.C. Lee, Y.J. Lee, P. Chang, M.L. Huang, M. Hong, C.-H. Hsu, J. Kwo, Appl. Phys. Lett. 90, 152908 (2007)
15. G.D. Wilk, R.M. Wallace, J.M. Anthony, J. Appl. Phys. 89, 5243 (2001)
16. M.M. Frank, G.D. Wilk, D. Starodub, T. Gustafsson, E. Garfunkel, Y. Chabal, J. Grazul, D.A. Muller, Appl. Phys. Lett. 86, 152904 (2005)
17. D.M. Adams, S. Leonard, D.R. Russel, R.J. Cernik, J. Phys. Chem. Solids 52, 1181 (1991)
18. J. Aarik, A. Aidla, H. Mändar, V. Sammelselg, T. Uustare, J. Cryst. Growth 220, 105 (2000)
19. D.R.G. Mitchell, A. Aidle, J. Aarik, Appl. Surf. Sci. 253, 606 (2006)
20. S. Dhar, M.S. Ramachandra Rao, S.B. Ogale, D.C. Kundaliya, S.R. Shinde, T. Venkatesan, S.J. Welz, R. Erni, N.D. Browning, Appl. Phys. Lett. 87, 241504 (2005)
21. M.S. Ramachandra Rao, D.C. Kundaliya, S.B. Ogale, L.F. Fu, S.J. Welz, N.D. Browning, V. Zaitsev, B. Varughese, C.A. Cardoso, A. Curtin, S. Dhar, S.R. Shinde, T. Venkatesan, S.E. Lofland, S.A. Schwarz, Appl. Phys. Lett. 88, 142505 (2006)
22. P.B. Hirsch, A. Howie, R.B. Nicholson, D.W. Pashley, M.J. Whelan, Electron Microscopy of Thin Crystals (Krieger, Malabar, 1977)
23. M.-W. Chu, I. Szafraniak, D. Hesse, M. Alexe, U. Goesele, Phys. Rev. B 72, 174112 (2005)
24. D. Hesse, J. Vac. Sci. Technol. A 5, 1696 (1987)
25. D.T. Margulies, F.T. Parker, M.L. Rudee, F.E. Spada, J.N. Chapman, P.R. Aitchison, A.E. Berkowitz, Phys. Rev. Lett. 79, 5162 (1997)
26. J. Robertson, Rep. Prog. Phys. 69, 327 (2006)