Fabrication of PECVD-silicon oxynitride-based optical waveguides

Materials Science and Engineering: B

Volumn 112, Issue 2-3 SPEC. ISS., 2004, Pages 154-159

  Alayo, M I ^a   Criado, D ^a   Carreno M N P ^a   Pereyra, I ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

Integrated optic; Plasma processing; Silicon oxynitride; Waveguides

Indexed keywords

INTEGRATED OPTOELECTRONICS; LIGHT PROPAGATION; OPTIMIZATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; POLARIZATION; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

ARRAYED WAVEGUIDE GRATINGS (AWG); FLAME HYDROLYSIS DEPOSITION (FHD); OPTICAL GAIN EQUILIZERS; PLASMA PROCESSING;

OPTICAL WAVEGUIDES;

EID: 4344715476     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2004.05.037     Document Type: Article

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