Preliminary evaluation of line edge roughness metrology based on CD-SAXS

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 191-198

  Jones, Ronald L ^a   Hu, Tengjiao ^a   Soles, Christopher L ^a   Lin, Eric K ^a   Wu, Wen Li ^a   Casa, Diego M ^b   Mahorowala, Arpan ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

CD Metrology; Sub 100 nm lithography; X ray scattering

Indexed keywords

CD METROLOGY; CRITICAL DIMENSION (CD); LINE EDGE ROUGHNESS (LER); SUB-100 NM LITHOGRAPHY;

FREQUENCIES; MICROELECTRONICS; NONDESTRUCTIVE EXAMINATION; PATTERN RECOGNITION; SCANNING ELECTRON MICROSCOPY; X RAY SCATTERING;

ROUGHNESS MEASUREMENT;

EID: 4344693772     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535693     Document Type: Conference Paper

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