Investigating line-edge roughness in calixarene fine patterns using Fourier analysis

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4228-4232

  Ishida, Masahiko ^a   Kobayashi, Kenji ^a   Fujita, Jun Ichi ^b   Ochiai, Yukinori ^b   Yamamoto, Hiromasa ^b   Tono, Seiji ^a  

^a NEC CORPORATION   (Japan)

^b TOKUYAMA CORPORATION   (Japan)

Author keywords

Electron beam lithography; Fourier analysis; Line edge roughness; Resist; X ray diffraction

Indexed keywords

AMORPHOUS FILMS; CRYSTALLIZATION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

LINE-EDGE ROUGHNESS;

PHOTORESISTS;

EID: 0036614065     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4228     Document Type: Article

References (8)