First review of a suitable metrology framework for the 65 nm technology node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 II, Issue , 2003, Pages 757-768

  Severgnini, Ermes ^a   Vasconi, Mauro ^a   Herisson, David ^a   Thony, Philippe ^b  

^a STMICROELECTRONICS   (France)

^b CEA LETI   (France)

Author keywords

AFM; CD; FIB; Metrology; Scatterometry; SEM

Indexed keywords

ATOMIC FORCE MICROSCOPY; HOLOGRAPHY; OPTICAL RESOLVING POWER; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SPATIAL VARIABLES MEASUREMENT; TECHNOLOGY TRANSFER;

CRITICAL DIMENSION MEASUREMENT; POINT PROJECTION MICROSCOPY; SCATTEROMETRY;

PHOTOLITHOGRAPHY;

EID: 0141834983     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482645     Document Type: Conference Paper

References (1)

1. "International Technology Roadmap for Semiconductors", 2001 Edition, Semiconductor Industry Association, http://public.itrs.net