Small angle x-ray scattering for sub-100 nm pattern characterization

Applied Physics Letters

Volumn 83, Issue 19, 2003, Pages 4059-4061

  Jones, Ronald L ^a   Hu, Tengjiao ^a   Lin, Eric K ^a   Wu, Wen Li ^a   Kolb, Rainer ^b   Casa, Diego M ^c   Bolton, Patrick J ^d   Barclay, George G ^d  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b EXXONMOBIL UPSTREAM RESEARCH COMPANY   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

^d SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INORGANIC NANOSCALE DEVICES; POLYMER PHOTORESIST GRATINGS;

CHARACTERIZATION; DIFFRACTION GRATINGS; PHOTORESISTS; POLYMERS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; SYNCHROTRONS; X RAY SCATTERING;

PHOTOLITHOGRAPHY;

EID: 0344083347     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1622793     Document Type: Article

References (13)

1. International Technology Roadmap for Semiconductors, 2001 Edition, SIA, 2001.
2. J. Villarubia, R. Dixson, S. Jones, J. R. Lowney, M. T. Postek, R. A. Allen, and M. W. Cresswell, Proc. SPIE 3677, 587 (1999).
3. C. Nelson, S. C. Palmateer, A. R. Forte, and T. M. Lyszczarz, J. Vac. Sci. Teohnol. B 17, 2488 (1999).
4. C. J. Raymond, M. R. Murnane, S. L. Prins, S. Sohail, H. Naqvi, and J. R. McNeil, J. Vac. Sci. Technol. B 15, 361 (1997).
5. M. Gailhanou, T. Baumbach, U. Marti, P. C. Silva, K K. Reinhart, and M. Ilegems, Appl. Phys. Lett. 62, 1623 (1993).
6. Q. Shen, C. C. Umbach, B. Weselak, and J. M. Blakely, Phys. Rev. B 48, 17967 (1993).
7. P. van der Sluis, J. J. M. Binsma, and T. van Dongen, Appl. Phys. Lett. 62, 3186 (1993).
8. M. Tolan, W. Press, F. Brinkop, and J. P. Kotthaus, Phys. Rev. B 51, 2239 (1995).
9. G. T. Baumbach, D. Lubbert, U. Pietsch, N. Darowski, L. Leprince, A. Talneau, and J. Schneck, Physica B 248, 343 (1998).
10. V. Holy, J. Stangl, G. Springholz, M. Pinczolits, and G. Bauer, J. Phys. D 34, Al (2001).
11. E. K. Lin, R. L. Jones, W.-L. Wu, J. G. Barker, P. J. Boulton, and G. G. Barclay, Proc. SPJE 4689, 541 (2002).
12. The data in this manuscript, in the figures, and in the tables are presented along with the standard uncertainty (±) involved in the measurement, where the uncertainty represents one standard deviation from the mean.
13. W.-L. Wu, E. K. Lin, Q. Lin, and M. Angelopoulos, J. Appl. Phys. 88, 7298 (2000).