Coulomb blockade in quasimetallic silicon-on-insulator nanowires

Applied Physics Letters

Volumn 75, Issue 23, 1999, Pages 3704-3706

  Tilke, A ^a   Blick, R H ^a   Lorenz, H ^a   Kotthaus, J P ^a   Wharam, D A ^b  

^a UNIVERSITY OF MUNICH   (Germany)

^b UNIVERSITY OF TÜBINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000425555     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.125435     Document Type: Article

References (11)

1. E. Leobandung, L. Guo, Y. Wang, and S. Y. Chou, Appl. Phys. Lett. 67, 938 (1995).
2. L. Zhuang, L. Guo, and S. Y. Chou, Appl. Phys. Lett. 72, 1205 (1998).
3. H. Ishikuro and T. Hiramoto, Appl. Phys. Lett. 71, 3691 (1997).
4. T. Sakamoto, H. Kawaura, and T. Baba, Appl. Phys. Lett. 72, 795 (1998).
5. R. A. Smith and H. Ahmed, J. Appl. Phys. 81, 2699 (1997).
6. A. Nylandsted Larsen, S. Yu. Shiryaev, E. Schwartz Sorensen, and P. Tidemand-Petersson, Appl. Phys. Lett. 48, 1805 (1986).
7. A. Tilke, M. Vogel, F. Simmel, A. Kriele, R. H. Blick, H. Lorenz, D. A. Wharam, and J. P. Kotthaus, J. Vac. Sci. Technol. B 17, 1594 (1999).
8. C. W. J. Beenakker, Phys. Rev. B 44, 1646 (1991).
9. C. Single, F. Zhou, H. Heidenmeyer, F. E. Prins, D. P. Kern, and E. Plies, J. Vac. Sci. Technol. 16, 3938 (1998).
10. A. S. Grove, O. Leistiko, Jr., and C. T. Sah, J. Appl. Phys. 35, 2695 (1964).
11. F. Iacona, V. Raineri, F. La Via, A. Terrasi, and E. Rimini, Phys. Rev. B 58, 10990 (1998).