Characterization of charging in CDSEM for 90-nm metrology and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 166-176

  Chen, Li Jui ^a   Lin, Shang Wei ^a   Gau, Tsai Sheng ^a   Lin, Burn J ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

CDSEM; Charging; OPE

Indexed keywords

ALGORITHMS; ELECTRIC CHARGE; ELECTRON BEAMS; EVALUATION; MEASUREMENT ERRORS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE STRUCTURES;

COULOMB FORCE; CRITICAL DIMENSION SCANNING ELECTRON MICROSCOPY; GLOBAL CHARGING; LOCAL CHARGING; OPTICAL PROXIMITY EFFECT;

OPTICAL VARIABLES MEASUREMENT;

EID: 0141612022     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483690     Document Type: Conference Paper

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