Application of scatterometry for CD and profile metrology in 193nm lithography process development

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 568-576

  Chen, Li Jui ^a   Ke, Chih Ming ^a   Yu, Shinn Sheng ^a   Gau, Tsai Sheng ^a   Chen, Pei Hung ^a   Ku, Yao Ching ^a   Lin, Burn J ^a   Engelhard, Dan ^b   Hetzer, Dave ^b   Yang, Jason ^b   Barry, Kelly ^b   Yap, Lip ^b   Yang, Wenge ^b  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^b A TEL Company   (United States)

Author keywords

CD metrology; Diffraction grating; Scatterometry; Spectroscopic ellipsometry

Indexed keywords

DIFFRACTION GRATINGS; ELLIPSOMETRY; LIGHT MEASUREMENT; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY; SENSITIVITY ANALYSIS; SPECTRUM ANALYSIS; TEMPERATURE;

BAKING TEMPERATURE; OPTICAL PROXIMITY EFFECT; SCATTEROMETRY; SPECTROSCOPIC ELLIPSOMETRY;

PHOTOLITHOGRAPHY;

EID: 0141500243     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483692     Document Type: Conference Paper

References (6)

1. C. M. Ke, T. S. Gau, P. H. Chen, Anthony Yen, B. J. Lin, T. Otaka, T. Jizumi, K. Sasada, and K. Sasada, and K. Ueda, "The effect of various ArF resist shrinkage amplitude on CD bias", SPIE v.4689, pp 997-1006, 2002.
2. L. J. Chen, S. W. Liu, T. S. Gau, and B. J. Lin, "Characterization of charging in CDSEM for 90nm metrology and beyond", submitted to SPIE v.5038, 2003.
3. X. Niu, N. Jakatdar, J. Bao, C. Spanos, and S. Yedur, "Specular Spectroscopic Scatterometry in DUV Lithography", SPIE v. 3677, pp 159-168.
4. N. Jakatdar, X. Niu, J. Bao, C. Spanos, S. Yedur, and A. Deleporte, "Phase Profilometry for the 193nm Lithography Gate Stack", SPIE v. 3998, pp 116-124.
5. J. Opsal, H. Chu, Y. Wen, Y. C. Chang, and G. Li, "Fundamental solutions for real-time optical CD metrology", SPIE v. 4689 pp 163-176.
6. J. Allgair, D. Benoit, R. Hershey, L. C. Litt, I. Abdulhalim, B. Braymer, M. Faeyrman, J. C. Robinson, U. Whitney, Y. Wu, P. Zalicki, and J. Seligson, "Manufacturing Considerations for Implementation of Scatterometry for Process Monitoring", SPIE pp 125-134.