Accuracy in CD-SEM metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 651-662

  Nikitin, A V ^a   Sicignano, A ^a   Yeremin, D Y ^a   Sandy, M ^a   Goldburt, T ^a  

^a Nanometrology LLC   (United States)

Author keywords

Accuracy; CD SEM metrology; Edge localization; Linear approximation; Precision; Threshold

Indexed keywords

ALGORITHMS; APPROXIMATION THEORY; IMAGE ANALYSIS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY;

CRITICAL DIMENSION; EDGE LOCALIZATION; FEATURE ANALYSIS ALGORITHMS; MAGNIFICATION; NANOMETROLOGY;

OPTICAL VARIABLES MEASUREMENT;

EID: 0141611976     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485017     Document Type: Conference Paper

References (1)

1. M. T. Postek, Critical Issues in Scanning Electron Microscope Metrology, J. Res. Natl. Inst. Stand. Technol, 99, 641, 1994.