Incorporation of fluorine in hydrogenated silicon carbide films deposited by pulsed glow discharge

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 4, 2004, Pages 1223-1228

  Jacobsohn, L G ^a   Afanasyev Charkin, I V ^a   Cooke, D W ^a   Schulze, R K ^a   Averitt, R D ^a   Nastasi, M ^a  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTIC RECOIL DETECTION (ERD); GRAPHICAL AGGLOMERATES; ION BEAM ANALYSIS (IBA); MASS DEPOSITION;

COMPUTER SIMULATION; ELECTRON CYCLOTRON RESONANCE; INFRARED SPECTROSCOPY; ION BEAMS; MICROELECTROMECHANICAL DEVICES; MONTE CARLO METHODS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON CARBIDE; SURFACE PROPERTIES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

FLUORINE;

EID: 4344599129     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1764820     Document Type: Article

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