SCOPUS 정보 검색 플랫폼

Volumn 12, Issue 10-11, 2003, Pages 2037-2041

Hard amorphous carbon-fluorine films deposited by PECVD using C2H2-CF4 gas mixtures as precursor atmospheres

Author keywords

Amorphous hydrogenated carbon; Fluorine; Mechanical properties; Structure

Indexed keywords

FLUORINE; HARDNESS; HYDROPHOBICITY; ORGANIC COMPOUNDS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STRESS ANALYSIS; THIN FILMS;

CARBON FILMS;

CARBON;

EID: 0346750557 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(03)00200-0 Document Type: Article

Times cited : (29)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.