Microfabrication of high-frequency vacuum electron devices

IEEE Transactions on Plasma Science

Volumn 32, Issue 3 I, 2004, Pages 1277-1291

  Ives, R Lawrence ^a  

^a IEEE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ELECTRIC DISCHARGE MACHINING; ELECTROMAGNETIC WAVES; ELECTRON DEVICE MANUFACTURE; ELECTROPLATING; ION BEAMS; LITHOGRAPHY; MICROWAVE OSCILLATORS; MOLDING; REACTIVE ION ETCHING; SPECTROSCOPY; VACUUM TECHNOLOGY;

BACKWARD WAVE OSCILLATOR; COLD CATHODE; DEEP REACTIVE ION ETCHING; ELECTROCHEMICAL MILLING; FIELD EMITTER ARRAY; FOCUSED ION BEAM; HIGH FREQUENCY ELECTRON DEVICES; HIGH POWER RF DEVICES; RADIO FREQUENCY RADIATION; VACUUM ELECTRON DEVICES;

ELECTRON DEVICES;

EID: 4344586983     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2004.827595     Document Type: Article

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