Orthogonal method for processing of SU-8 resist in UV-LIGA

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4557, Issue , 2001, Pages 462-466

  Jingquan, Liu ^a   Jun, Zhu ^a   Guipu, Ding ^a   Xiaolin, Zhao ^a   Bingchu, Cai ^a  

^a Shanghai Jiao Tong University   (China)

Author keywords

High aspect ratio; MEMS; SU 8; UV LIGA

Indexed keywords

ADHESION; ASPECT RATIO; EPOXY RESINS; METALLIC FILMS; MICROELECTROMECHANICAL DEVICES; OXIDATION; TITANIUM; ULTRAVIOLET RADIATION;

NEAR ULTRAVIOLET PHOTORESISTS;

PHOTORESISTS;

EID: 0035765832     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.442980     Document Type: Conference Paper

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