Sub-micron high aspect ratio silicon beam etch

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4592, Issue , 2001, Pages 315-325

  O,Brien, Gary J ^a,b   Monk, David J ^b   Najafi, Khalil ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; PHOTOLITHOGRAPHY; PHOTORESISTS; REACTIVE ION ETCHING; SINGLE CRYSTALS;

SURFACE TECHNOLOGY SYSTEMS (STS);

SILICON;

EID: 0035772908     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.448983     Document Type: Article

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