Formation of (Ti,Al) NTi2AlN multilayers after annealing of TiNTiAl (N) multilayers deposited by ion beam sputtering

Journal of Applied Physics

Volumn 103, Issue 8, 2008, Pages

  Dolique, V ^a   Jaouen, M ^a   Cabioc'H, T ^a   Pailloux, F ^a   Gurin Ph ^a   Plosin V ^b  

^a UNIVERSITÉ DE POITIERS   (France)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ION BEAMS; SPUTTERING; TITANIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

ION BEAM SPUTTERING; TIAL SUBLAYERS;

MULTILAYERS;

EID: 43149088021     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2894589     Document Type: Article

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