Preparation and characterization of copper nitride films at various nitrogen contents by reactive radio-frequency magnetron sputtering

Materials Letters

Volumn 60, Issue 15, 2006, Pages 1809-1812

  Yuan, X M ^a   Yan, P X ^a,b   Liu, J Z ^a  

^a LANZHOU UNIVERSITY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

Copper nitride film; Electrical resistivity; Optical energy gap; Surface morphology

Indexed keywords

COPPER COMPOUNDS; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; ENERGY GAP; MAGNETRON SPUTTERING; NITROGEN; SURFACES;

COPPER NITRIDE FILM; NITROGEN CONTENT; OPTICAL ENERGY GAP; RADIO FREQUENCY MAGNETRON SPUTTERING;

CONDUCTIVE FILMS;

EID: 33748265120     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2005.12.028     Document Type: Article

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