Charge trapping effect at the contact between a high-work-function metal and Ta2O5 high-k dielectric

Journal of Physics D: Applied Physics

Volumn 41, Issue 10, 2008, Pages

  Novkovski, N ^a   Skeparovski, A ^a   Atanassova, E ^b  

^a SS CYRIL AND METHODIUS UNIVERSITY   (Macedonia)

^b INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; ELECTRODES; LASER PULSES; TANTALUM COMPOUNDS; VACANCIES; WORK FUNCTION;

CONDUCTION BAND; CONSTANT CURRENT; WORK-FUNCTION METAL;

CHARGE TRAPPING;

EID: 43049147291     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/10/105302     Document Type: Article

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