Metal-insulator-metal capacitors' current instability improvement using dielectric stacks to prevent oxygen vacancies formation

Applied Physics Letters

Volumn 91, Issue 13, 2007, Pages

  Manceau, J P ^a   Bruyere, S ^a   Jeannot, S ^a   Sylvestre, A ^b   Gonon, P ^c  

^a STMICROELECTRONICS   (France)

^b LABORATOIRE D ELECTROTECHNIQUE DE GRENOBLE   (France)

^c Joseph Fourier University   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRIC CURRENTS; ELECTRODES; MIM DEVICES; OXYGEN VACANCIES;

ANGSTROMS; DIELECTRIC STACKS; METAL-INSULATOR-METAL (MIM) CAPACITORS;

CAPACITORS;

EID: 34848836983     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2790478     Document Type: Article

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