Influence of microstructure on the chemical diffusion of lithium ions in amorphous lithiated tungsten oxide films

Electrochimica Acta

Volumn 46, Issue 22, 2001, Pages 3415-3419

  Lee, Se Hee ^a   Cheong, Hyeonsik M ^a,b   Tracy, C Edwin ^a   Mascarenhas, Angelo ^a   Pitts, Roland ^a   Jorgensen, Gary ^a   Deb, Satyen K ^a  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^b Sogang University   (South Korea)

Author keywords

ac Impedance; Chemical diffusion; Lithium insertion; Raman; Tungsten oxide

Indexed keywords

DEPOSITION; DIFFUSION IN SOLIDS; IONS; LITHIUM COMPOUNDS; MICROSTRUCTURE; PARTIAL PRESSURE; RAMAN SCATTERING;

AMORPHOUS LITHIATED TUNGSTEN OXIDE FILMS; CHEMICAL DIFFUSION; IMPEDENCE SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 0035420987     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(01)00541-2     Document Type: Article

References (19)