Airborne molecular contamination: Cleanroom control strategies

Solid State Technology

Volumn 39, Issue 7, 1996, Pages 211-214

  Higley, John K ^a,b,c,d   Joffe, Michael A ^c,e,f,g  

^a Extraction Systems Inc   (United States)

^b DENISON UNIVERSITY   (United States)

^c Extraction Systems Inc

^d Extraction Systems Inc   (United States)

^e MOSCOW INSTITUTE OF PHYSICS AND TECHNOLOGY   (Russian Federation)

^f MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^g Institute of Chemical Physics

Author keywords

[No Author keywords available]

Indexed keywords

CLEAN ROOMS; CONTAMINATION; PROCESS CONTROL; STANDARDS;

AIRBORNE MOLECULAR CONTAMINATION (AMC); CLEANROOM CONTROL; CONTAMINATION CONTROL;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0030177145     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (11)

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