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Volumn 69, Issue 23, 2004, Pages

Evolution of the Ge/Si(001) wetting layer during Si overgrowth and crossover between thermodynamic and kinetic behavior

Author keywords

[No Author keywords available]

Indexed keywords

GERMANIUM; SILICON;

EID: 42749099321     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.69.235318     Document Type: Article
Times cited : (29)

References (34)
  • 28
    • 33646638108 scopus 로고    scopus 로고
    • note
    • Quenched MD is a structural relaxation method where the atoms are moved at 0 K just along the force direction.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.