Normal and anti Meyer-Neldel rule in conductivity of highly crystallized undoped microcrystalline silicon films

Journal of Non-Crystalline Solids

Volumn 354, Issue 19-25, 2008, Pages 2263-2267

  Ram, Sanjay K ^a   Kumar, Satyendra ^a   Roca i Cabarrocas, P ^b  

^a INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

^b LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

Amorphous semiconductors; Chemical vapor deposition; Conductivity; Electrical and electronic properties; Ellipsometry; Films and coatings; Microcrystallinity; Microstructure; Photoconductivity; Plasma deposition; Solar cells; Surfaces and interfaces; Thin film transistors

Indexed keywords

AMORPHOUS SEMICONDUCTORS; CHEMICAL VAPOR DEPOSITION; ELECTRONIC PROPERTIES; ELLIPSOMETRY; HYDROGENATION; MICROCRYSTALLINE SILICON; MICROSTRUCTURE; SOLAR CELLS; THIN FILM TRANSISTORS;

ANTI MEYER-NELDEL RULE; BAND TAIL TRANSPORT; DENSITY OF STATES; STATISTICAL SHIFT;

PHOTOCONDUCTIVITY;

EID: 42649136553     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.10.051     Document Type: Article

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