The inverse Meyer-Neldel rule in thin-film transistors with intrinsic heterogeneous silicon

Applied Physics Letters

Volumn 74, Issue 7, 1999, Pages 1012-1014

  Meiling, H ^a,b   Schropp, R E I ^b  

^a ASML   (Netherlands)

^b UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001298870     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.123439     Document Type: Article

References (17)

1. W. Meyer and H. Neldel, Z. Tech. Phys. (Leipzig) 18, 588 (1937).
2. W. B. Jackson, Phys. Rev. B 38, 3595 (1988).
3. H. Overhof and W. Beyer, Philos. Mag. B 47, 377 (1983).
4. B.-G. Yoon and C. Lee, Appl. Phys. Lett. 51, 1248 (1987).
5. X. Wang, Y. Bar-Yam, D. Adler, and J. D. Joannopoulos, Phys. Rev. B 38, 1601 (1988).
6. G. Lucovsky and H. Overhof, J. Non-Cryst. Solids 164-166, 973 (1993).
7. A. Rubino, M. L. Addonizio, G. Conte, G. Nobile, E. Terzini, and A. Madan, in Amorphous Silicon Technology - 1993, edited by E. A. Schiff, M. J. Thompson, A. Madan, K. Tanaka, and P. G. LeComber (Materials Research Society, Pittsburgh, PA, 1993), Vol. 297, p. 509.
8. R. Brüggemann, M. Rojahn, and M. Rösch, Phys. Status Solidi 166, R11 (1998).
9. R. Schumacher, P. Thomas, K. Weber, W. Fuhs, F. Djamdji, P. G. Le Comber, and R. E. I. Schropp, Philos. Mag. B 58, 389 (1988).
10. M. Kondo, Y. Chida, and A. Matsuda, J. Non-Cryst. Solids 198-200, 178 (1996).
11. H. Meiling and R. E. I. Schropp, Appl. Phys. Lett. 70, 2681 (1997).
12. A. H. Mahan, J. Carapella, B. P. Nelson, R. S. Crandall, and I. Balberg, J. Appl. Phys. 69, 6728 (1991).
13. H. Matsumura, Appl. Phys. Lett. 51, 804 (1987).
14. J. K. Rath, F. D. Tichelaar, H. Meiling, and R. E. I. Schropp, in Amorphous and Microcrystalline Silicon Technology - 1998, edited by R. Schropp, H. M. Branz, M. Hack, I. Shimizu, and S. Wagner (Materials Research Society, Warrendale, PA), Vol 507, p. 879.
15. A. M. Brockhoff, E. H. C. Ullersma, H. Meiling, F. H. P. M. Habraken, and W. F. van der Weg, Appl. Phys. Lett. 73, 3244 (1998).
16. C. van Berkel, in Amorphous and Microcrystalline Semiconductor Devices Vol. II: Materials and Device Physics, edited by J. Kanicki (Artech House, Boston, 1992), p. 397, and references therein.
17. J. K. Rath, F. D. Tichelaar, H. Meiling, and R. E. I. Schropp, in Amorphous and Microcrystalline Silicon Technology - 1998, edited by R. Schropp, H. M. Branz, M. Hack, I. Shimizu, and S. Wagner (Materials Research Society, Warrendale, PA), Vol. 507, p. 31.