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Volumn 65, Issue 3, 2002, Pages 1-8

Surface transport kinetics in low-temperature silicon deposition determined from topography evolution

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[No Author keywords available]

Indexed keywords


EID: 4243616227     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.65.035311     Document Type: Article
Times cited : (3)

References (27)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.