Systematic study of the evolution of texture and electrical properties of ZrNx thin films by reactive DC magnetron sputtering

Thin Solid Films

Volumn 444, Issue 1-2, 2003, Pages 111-119

  Liu, Chuan Pu ^a   Yang, Heng Ghieh ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Electrical properties and measurements; Nitride; Sputtering; Zirconium

Indexed keywords

ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; TEXTURES; ZIRCONIUM COMPOUNDS;

ATOMIC RATIO;

THIN FILMS;

EID: 0142075185     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01191-X     Document Type: Article

References (21)

1. Milosev I., Strehblow H.H., Navinsel B. Thin Solid Films. 303:1997;246.
2. Yanagisawa H., Sasaki K., Miyake H., Abe Y. Jpn. J. Appl. Phys. 39:2000;5987.
3. Takeyama M.B., Noya A., Sakanishi K. J. Vac. Sci. Technol. B. 18:2000;1333.
4. Elbaum L.K., Wittmer M., Ting C.Y., Cuomo J.J. Thin Solid Films. 104:1983;81.
5. Ostling M., Nygren S., Petersson C.S. Thin Solid Films. 145:1986;81.
6. Chou W.J., Yu G.P., Huang J.H. Thin Solid Films. 405:2002;162.
7. Huang J.H., Hsu C.Y., Chen S.S., Yu G.P. Mater. Chem. Phys. 77:2003;14.
8. Benia H.M., Guemmaz M., Schmerber G., Mosser A., Parlebas J.-C. Appl. Surf. Sci. 200:2002;231.
9. Lee M.B., Kawasaki M., Yoshimoto M., Kumagai M., Koinuma H. Jpn. J. Appl. Phys. 33:1994;6308.
10. Nagao M., Fujimori Y., Gotoh Y., Tsuji H., Ishikawa J. J. Vac. Sci. Technol. B. 16:1998;829.
11. Ma C.H., Huang J.H., Chen H. Surf. Coat. Technol. 133-134:2000;289.
12. Inoue S., Tominaga K., Howson R.P., Kusaka K. J. Vac. Sci. Technol. A. 13:1995;2808.
13. Wu D., Zhang Z., Fu W., Fan X., Guo H. Appl. Phys. A. 64:1997;593.
14. Pichon L., Straboni A., Girardeau T., Drouet M. J. Appl. Phys. 87:2000;925.
15. Zhitomirsky V.N., Grimberg I., Boxman R.L., Travitzky N.A., Goldsmith S., Weiss B.Z. Surf. Coat. Technol. 94-95:1997;207.
16. Chun J.S., Petrov I., Greene J.E. J. Appl. Phys. 86:1999;3633.
17. Yotsuya T., Yoshitake M., Kodama T. Cryogenics. 37:1997;817.
18. Yoshitake W.J., Yotsuya T., Ogawa S. Jpn. J. Appl. Phys. 31:1992;4002.
19. Johansson B.O., Hentzell H.T.G., Harper J.M.E., Aiomo J.J. J. Mater. Res. 1:1986;442.
20. Shin C.S., Gall D., Kim Y.W., Hellgren N., Petrov I., Greene J.E. J. Appl. Phys. 92:2002;5084.
21. Kim S.P., Choi H.M., Choi S.K. Thin Solid Films. 322:1998;298.