SCOPUS 정보 검색 플랫폼

Volumn 92, Issue 13, 2008, Pages

Electrical hysteresis of the Ti0.25 Al0.75 Ox dielectric films after high-temperature treatment

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; HYSTERESIS; SOLID STATE REACTIONS; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRICAL HYSTERESIS; HIGH TEMPERATURE TREATMENT; NANOSIZED CRYSTALS; POSITIVE FLATBAND VOLTAGE;

DIELECTRIC FILMS;

EID: 41649086320 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.2906364 Document Type: Article

Times cited : (3)

References (14)

1
- 33748614600
- E. P. Gusev, V. Narayanan, and M. M. Frank, IBM J. Res. Dev. 50, 387 (2006).
- (2006) IBM J. Res. Dev. , vol.50 , pp. 387
- Gusev, E.P.¹ Narayanan, V.² Frank, M.M.³

2
- 0036974829
- A. Javey, H. Kim, M. Brink, Q. Wang, A. Ural, J. Guo, P. McIntyre, P. McEuen, M. Lundstrom, and H. J. Dai, Nat. Mater. 1, 241 (2002).
- (2002) Nat. Mater. , vol.1 , pp. 241
- Javey, A.¹ Kim, H.² Brink, M.³ Wang, Q.⁴ Ural, A.⁵ Guo, J.⁶ McIntyre, P.⁷ McEuen, P.⁸ Lundstrom, M.⁹ Dai, H.J.¹⁰

3
- 0035872897
- G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys. 89, 5243 (2001).
- (2001) J. Appl. Phys. , vol.89 , pp. 5243
- Wilk, G.D.¹ Wallace, R.M.² Anthony, J.M.³

4
- 33746594936
- M. H. Zhang, I. J. Ok, H. S. Kim, F. Zhu, T. Lee, G. Thareja, L. Yu, and J. C. Lee, Appl. Phys. Lett. 89, 042902 (2006).
- (2006) Appl. Phys. Lett. , vol.89 , pp. 042902
- Zhang, M.H.¹ Ok, I.J.² Kim, H.S.³ Zhu, F.⁴ Lee, T.⁵ Thareja, G.⁶ Yu, L.⁷ Lee, J.C.⁸

5
- 20844440321
- M. M. Frank, G. D. Wilk, D. Starodub, T. Gustafsson, E. Garfunkel, Y. Chabal, J. Grazul, and D. A. Muller, Appl. Phys. Lett. 86, 152904 (2005).
- (2005) Appl. Phys. Lett. , vol.86 , pp. 152904
- Frank, M.M.¹ Wilk, G.D.² Starodub, D.³ Gustafsson, T.⁴ Garfunkel, E.⁵ Chabal, Y.⁶ Grazul, J.⁷ Muller, D.A.⁸

6
- 0035848123
- M. Copel, E. Cartier, and F. M. Ross, Appl. Phys. Lett. 78, 1607 (2001).
- (2001) Appl. Phys. Lett. , vol.78 , pp. 1607
- Copel, M.¹ Cartier, E.² Ross, F.M.³

7
- 13744250526
- O. Auciello, W. Fan, B. Kabius, S. Saha, J. A. Carlisle, R. P. H. Chang, C. Lopez, E. A. Irene, and R. A. Baragiola, Appl. Phys. Lett. 86, 042904 (2005).
- (2005) Appl. Phys. Lett. , vol.86 , pp. 042904
- Auciello, O.¹ Fan, W.² Kabius, B.³ Saha, S.⁴ Carlisle, J.A.⁵ Chang, R.P.H.⁶ Lopez, C.⁷ Irene, E.A.⁸ Baragiola, R.A.⁹

8
- 33847155442
- L. Shi, Y. D. Xia, B. Xu, and Z. G. Liu, J. Appl. Phys. 101, 034102 (2007).
- (2007) J. Appl. Phys. , vol.101 , pp. 034102
- Shi, L.¹ Xia, Y.D.² Xu, B.³ Liu, Z.G.⁴

9
- 18744381306
- H. Kim and P. C. Mclntyre, J. Appl. Phys. 92, 5094 (2002).
- (2002) J. Appl. Phys. , vol.92 , pp. 5094
- Kim, H.¹ McLntyre, P.C.²

10
- 33644908020
- Y. Zhu, D. T. Zhao, R. G. Li, and J. L. Liu, Appl. Phys. Lett. 88, 103507 (2006).
- (2006) Appl. Phys. Lett. , vol.88 , pp. 103507
- Zhu, Y.¹ Zhao, D.T.² Li, R.G.³ Liu, J.L.⁴

11
- 36749001530
- L. Shi, J. Yin, K. B. Yin, F. Gao, Y. D. Xia, and Z. G. Liu, Appl. Phys. A: Mater. Sci. Process. 90, 379 (2008).
- (2008) Appl. Phys. A: Mater. Sci. Process. , vol.90 , pp. 379
- Shi, L.¹ Yin, J.² Yin, K.B.³ Gao, F.⁴ Xia, Y.D.⁵ Liu, Z.G.⁶

12
- 33646524777
- K. K. S. Curreem, P. F. Lee, K. S. Wong, J. Y. Dai, M. J. Zhou, J. Wang, and Q. Li, Appl. Phys. Lett. 88, 182905 (2006).
- (2006) Appl. Phys. Lett. , vol.88 , pp. 182905
- Curreem, K.K.S.¹ Lee, P.F.² Wong, K.S.³ Dai, J.Y.⁴ Zhou, M.J.⁵ Wang, J.⁶ Li, Q.⁷

13
- 35949034881
- H. Ihrig and D. Hennings, Phys. Rev. B 17, 4593 (1978).
- (1978) Phys. Rev. B , vol.17 , pp. 4593
- Ihrig, H.¹ Hennings, D.²

14
- 0001588692
- C. Ang, Z. Yu, and L. E. Cross, Phys. Rev. B 62, 228 (2000).
- (2000) Phys. Rev. B , vol.62 , pp. 228
- Ang, C.¹ Yu, Z.² Cross, L.E.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.