Three-dimensional metal patterning over nanostructures by reversal imprint

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 2, 2008, Pages 632-635

  Peng, C ^a   Cardozo, B L ^a   Pang, S W ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

METAL PATTERNING; REVERSAL IMPRINT;

GLASS; LITHOGRAPHY; SUBSTRATES; TOPOGRAPHY;

NANOSTRUCTURES;

EID: 41549142717     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2897319     Document Type: Article

References (14)

1. C. Kim, M. Shtein, and S. R. Forrest, Appl. Phys. Lett. 80, 4051 (2002).
2. Y. L. Loo, R. L. Willett, K. W. Baldwin, and J. A. Rogers, Appl. Phys. Lett. 81, 562 (2002).
3. K. Ojima, Y. Otsuka, T. Matsumoto, T. Kawai, K. Nakamatsu, and S. Matsui, Appl. Phys. Lett. 87, 234110 (2005).
4. S. Jeon, E. Menard, J. U. Park, J. Maria, M. Meitl, J. Zaumseil, and J. A. Rogers, Adv. Mater. (Weinheim, Ger.) 16, 1369 (2004).
5. E. Menard, L. Bilhaut, J. Zaumseil, and J. A. Rogers, Langmuir 20, 6871 (2004).
6. G. S. Ferguson, M. K. Chaudhury, G. B. Sigal, and G. M. Whitesides, Science 253, 776 (1991).
7. X. D. Huang, L. R. Bao, X. Cheng, L. J. Guo, S. W. Pang, and A. F. Yee, J. Vac. Sci. Technol. B 20, 2872 (2002).
8. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, J. Vac. Sci. Technol. B 14, 4129 (1996).
9. L. R. Bao, X. Cheng, X. D. Huang, L. J. Guo, S. W. Pang, and A. F. Yee, J. Vac. Sci. Technol. B 20, 2881 (2002).
10. P. Czuprynski, O. Joubert, L. Vallier, M. Puttock, and M. Heitzmann, J. Vac. Sci. Technol. B 16, 147 (1998).
11. M. Nordström, A. Johansson, E. S. Noguerón, B. Clausen, M. Calleja, and A. Boisen, Microelectron. Eng. 78-79, 152 (2005).
12. W. Hu, B. Yang, C. Peng, and S. W. Pang, J. Vac. Sci. Technol. B 24, 2225 (2006).
13. F. Aristone, P. Datta, Y. Desta, A. M. Espindola, and J. Goettert, Proc. SPIE 4982, 65 (2003).
14. V. R. Dukkipati and S. W. Pang, J. Vac. Sci. Technol. B 25, 368 (2007).