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Sumitomo Chemical America, Inc., Santa Clara, CA) was used for a polymer film
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Photoresist (PFI-88A2, Sumitomo Chemical America, Inc., Santa Clara, CA) was used for a polymer film.
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Photoresist (PFI-88A2)
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16
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79957943662
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note
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Ar sputter etch and other RIE processes in this work were carried out in a parallel-plate (diameter: ∼24 cm) RIE system (PlasmaTherm 790 series).
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17
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0001502727
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2/Si) was then soaked in the solution for 90 min. To remove excess OTS, the soak was followed by the sonication in chloroform for 30 min, after which it was baked for 1 h at 150°C in air. The metal strike layer consisted of a 30-nm-thick Au film deposited onto the pentacene surface. jaJAPIAU 0021-8979
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2/Si) was then soaked in the solution for 90 min. To remove excess OTS, the soak was followed by the sonication in chloroform for 30 min, after which it was baked for 1 h at 150°C in air. The metal strike layer consisted of a 30-nm-thick Au film deposited onto the pentacene surface. jap JAPIAU 0021-8979
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