X-ray photoelectron spectroscopy analyses of metal stacks etched in Cl2/BCl3 high density plasmas

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 1, 1998, Pages 147-158

  Czuprynski, P ^a   Joubert, O ^a,d   Vallier, L ^a,d   Puttock, M ^b   Heitzmann, M ^c  

^a ORANGE LABS   (France)

^b Electrotech   (United Kingdom)

^c CEA GRENOBLE   (France)

^d INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ALUMINUM COMPOUNDS; CHLORINE; ETCHING; MIXTURES; PASSIVATION; PHOTORESISTS; PLASMAS; SUBSTRATES; SURFACES;

ALUMINUM OXIDE; ANISOTROPIC ETCHING; HIGH DENSITY PLASMA; INDUCTIVELY COUPLED PLASMA SOURCE; METAL STACKS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0031674816     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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