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Volumn 20, Issue 4, 2002, Pages 1368-1378

Structure and photoluminescence features of nanocrystalline Si/SiO2 films produced by plasma chemical vapor deposition and post-treatment

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; COMPOSITION; CRYSTAL STRUCTURE; HIGH TEMPERATURE EFFECTS; KINETIC THEORY; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SILICON; SYNTHESIS (CHEMICAL);

EID: 0035982542     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1490389     Document Type: Conference Paper
Times cited : (24)

References (62)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.