Electron density measurements in a slot antenna microwave plasma source by means of the plasma oscillation method

Plasma Sources Science and Technology

Volumn 8, Issue 3, 1999, Pages 440-447

  Schwabedissen, A ^a   Soll, C ^a   Brockhaus, A ^a   Engemann, J ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARRIER CONCENTRATION; COATINGS; MATHEMATICAL MODELS; MICROWAVES; OXYGEN; PLASMA DENSITY; PLASMA DIAGNOSTICS; PLASMA OSCILLATIONS; PLASMA POLYMERIZATION; PLASMA PROBES; SLOT ANTENNAS;

HEXAMETHYLDISILOXANE; LANGMUIR PROBE; PLASMA CHAMBER;

PLASMA SOURCES;

EID: 0032645353     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/8/3/314     Document Type: Article

References (43)

1. Moisan M and Pelletier J (eds) 1992 Microwave Excited Plasmas (Amsterdam: Elsevier)
2. Roth J R 1995 Industrial Plasma Engineering vol I (Bristol: IOP Publishing)
3. Langmuir I and Mott-Smith H M 1926 Phys. Rev. 28 727
4. Heidenreich J E, Parasczak J E, Moisan M and Sauve G 1987 J. Vac. Sci. Technol. B 5 347
5. Heidenreich J E, Parasczak J E, Moisan M and Sauve G 1987 J. Vac. Sci. Technol. B 6 288
6. Kortshagen U 1993 J. Phys. D: Appl. Phys. 26 1230
7. Brockhaus A, Borchardt C and Engemann J 1994 Plasma Sources Sci. Technol. 3 539
8. Overzet L J and Hopkins M B 1993 J. Appl. Phys. 74 4323
9. Hebner G A 1996 J. Vac. Sci. Technol. A 14 2158
10. Behle S, Georg A, Gültzow M, Lagrou S, Brockhaus A and Engemann J 1997 Proc. Front. Low Temp. Plasma Diagn. II (Bad Honnef, Germany: Arbeitsgemeinschaft Plasmaphysik) p 91
11. Behle S, Georg A, Brockhaus A and Engemann J 1999 Plasma Sources Sci. Technol. submitted
12. Shirakawa T and Sugai H 1993 Japan. J. Appl. Phys. 32 5129
13. Ahn T H, Nakamura K and Sugai H 1995 Japan. J. Appl. Phys. 34 L 1405
14. Looney D C and Brown S C 1954 Phys. Rev. 93 965
15. Goto M, Toyoda H, Kitagowa M, Hirao T and Sugai H 1996 Proc. IEEE Conf. Plasma Science (New York: IEEE) p 96
16. Schwabedissen A, Benck E C and Roberts J R 1998 Plasma Sources Sci. Technol. 7 119
17. Wrobel A M, Kryszewski M and Gazicki M 1983 J. Macromol. Sci. Chem. A 20 583
18. Wrobel A M and Wertheimer M R 1990 Plasma Deposition Treatment and Etching of Polymers ed R d'Agostino (New York: Academic) p 63
19. Wrobel A M, Wertheimer M R, Dib J and Schneider H P 1984 J. Macromol. Sci. Chem. A 14 321
20. Korzec D, Theirich D, Werner F, Traub K and Engemann J 1995 J. Surf. Coat. Technol. 74-75 67
21. Bunting W D and Heikkila W J 1970 J. Appl. Phys. 41 2263
22. Klagge S 1975 Beitr. Plasmaphysik 15 309
23. Lin Q, Lin X, Yu Y, Wang H and Chen J 1993 J. Appl. Phys. 74 4899
24. Godyak V A, Piejak R B and Alexandrovich B M 1992 Plasma Sources Sci. Technol. 1 36
25. Annaratone B M, Counsell G F, Kawano H and Allen J E 1992 Plasma Sources Sci. Technol. 1 232
26. Werner F, Korzec D and Engemann J 1994 Plasma Sources Sci. Technol. 3 437
27. Korzec D, Werner F, Brockel A, Engemann J, Schneider T P and Nemanich R J 1995 J. Vac. Sci. Technol. A 13 2074
28. Laframboise J G 1966 University of Toronto Institute for Aerospace Studies Report No 100
29. Druyvesteyn H J 1930 Z. Phys. 64 781
30. Godyak V A, Piejak R B and Alexandrovich B M 1993 J. Appl. Phys. 73 3657
31. Schwabedissen A, Benck E C and Roberts J R 1997 Phys. Rev. E 55 3450
32. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley)
33. Chen F F 1984 Introduction to Plasma Physics and Controlled Fusion (New York: Plenum)
34. Briggs R J 1964 Electron Stream Interaction with Plasmas (Cambridge, MA: MIT Press)
35. Thompson J R 1971 Phys. Fluids 14 1532
36. Smith D and Plumb I C 1973 J. Phys. D: Appl. Phys. 6 196
37. Sudit I D and Woods R C 1994 J. Appl. Phys. 78 4488
38. Tuszewski M and Tobin J A 1996 Plasma Sources Sci. Technol. 5 640
39. Render U and Wiesemann K 1995 Plasma Chem. Plasma Process. 15 123
40. Brockhaus A, Korzec D, Werner F, Yuan Y and Engemann J 1995 Surface Coat. Technol. 74-75 431
41. Overzet L J and Hopkins M B 1993 J. Appl. Phys. 74 4323
42. Ellis H W, Pai R Y, McDaniel E W, Mason E A and Viehland L A 1976 At. Data Nucl. Data Tables 17 177
43. Soll Ch 1997 Proc. 11th Int. Colloq. on Plasma Process. (LeMans, France) p 157