Plasma enhanced chemical vapor deposition of a-C:H films in CH4-CO2 plasma: Gas composition and substrate biasing effects on the film structure and growth process

Thin Solid Films

Volumn 516, Issue 12, 2008, Pages 3910-3918

  Gottardi, G ^a   Laidani, N ^a   Bartali, R ^a   Micheli, V ^a   Anderle, M ^a  

^a ITC IRST   (Italy)

Author keywords

Carbon; Plasma enhanced chemical vapor deposition; Pulsed bias; Structural properties

Indexed keywords

BIAS CURRENTS; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

PULSED BIAS;

CARBON;

EID: 40749133264     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.07.179     Document Type: Article

References (25)

1. Robertson J. Diamond Relat. Mater. 4 (1993) 361
2. Robertson J. Mater. Sci. Eng., R Rep. 37 (2002) 129
3. Grill A. Cold Plasma in Materials Fabrication (1993), IEEE Press, New York
4. F. Jansen, Plasma-Enhanced Chemical Vapor Deposition, H.G. Tompkins Monograph Ed., New York, 1997.
5. von Keudell A., Meier M., and Hopf C. Diamond Relat. Mater. 11 (2002) 969
6. Buckle K.A., Rodgers J., and Pastor K. Appl. Phys. Lett. 50 (1992) 2601
7. Hsieh J.H., Fong L.H., Yi S., and Metha G. Surf. Coat. Technol. 112 (1999) 245
8. Lung B.H., Chiang M.J., and Hon M.H. Mater. Chem. Phys. 72 (2001) 163
9. Colthup N.B., Daly L.H., and Wiberly S.E. Introduction to Infrared and Raman Spectroscopies (1969), Academic Press, New York
10. Gielen J.W.A.M., van de Sanden M.C.M., and Scharam D.C. Thin Solid Films 271 (1995) 56
11. Veres M., Koos M., and Pocsik I. Diamond Relat. Mater. 11 (2002) 1110
12. Brodsky M.H., Cardona M., and Cuomo J.J. Phys. Rev., B 16 (1977) 3536
13. Gielen J.W.A.M., Kleusken P.R.M., van de Sanden M.C.M., Dekempeneer E.H.A., and Meneve J. J. Appl. Phys. 80 10 (1996) 5986 (and references therein)
14. Oliver W.C., and Pharr G.M. J. Mater. Res. 7 (1992) 1564
15. Chen C.-F., Chen S.-H., Ko H.-W., and Hsu S.E. Diamond Relat. Mater. 3 (1994) 443
16. Petherbridge J., May P.W., Pearce S.R.J., Rosser K.N., and Ashfold M.N.R. Diamond Relat. Mater. 10 (2001) 393
17. Aubry O., Delfau J.-L., Met C., Vandenbulcke L., and Vovelle C. Diamond Relat. Mater. 13 (2004) 116
18. Eaton S.C., and Sunkara M.K. Diamond Relat. Mater. 9 (2000) 1320
19. Bachmann P.K., Leers D., and Lydtin H. Diamond Relat. Mater. 1 (1991) 1
20. Mollart T.P., and Lewis K.L. Diamond Relat. Mater. 8 (1999) 236
21. Elliot M.A., May P.W., Petherbridge J., Leeds S.M., Ashfold M.N.R., and Wang W.N. Diamond Relat. Mater. 9 (2000) 311
22. Gottardi G., Laidani N., Bartali R., Filippi M., Calliari L., Brusa R.S., Mariazzi S., Macchi C., and Anderle M. Diamond Relat. Mater. 14 (2005) 1031
23. Bubenzer A., Dischler B., Brandt G., and Koidl P. J. Appl. Phys. 54 (1983) 4590
24. Calliari L., Filippi M., Laidani N., Gottardi G., Bartali R., Micheli V., and Anderle M. In: Messina G., and Santangelo S. (Eds). Carbon: the future material for advanced technology applications, Springer' series Topics in Applied Physics (2005) 439
25. Ford I.J. J. Phys. D: Appl. Phys. 29 (1996) 2229