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Volumn 14, Issue 3-7, 2005, Pages 1031-1035
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Amorphous carbon films PACVD in CH4-CO2 under pulsed and continuous substrate bias conditions
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Author keywords
Amorphous hydrogenated carbon; Bias growth; Hardness; Plasma CVD
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Indexed keywords
ADHESION;
CARBON;
ELECTRIC POTENTIAL;
FILM GROWTH;
HARDNESS;
HYDROGENATION;
ION BOMBARDMENT;
METHANE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SUBSTRATES;
AMORPHOUS CARBON FILMS;
AMORPHOUS HYDROGENATED CARBON;
BIAS GROWTH;
PLASMA CVD;
AMORPHOUS FILMS;
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EID: 18444391259
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/j.diamond.2004.10.016 Document Type: Conference Paper |
Times cited : (8)
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References (18)
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