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Volumn 14, Issue 3-7, 2005, Pages 1031-1035

Amorphous carbon films PACVD in CH4-CO2 under pulsed and continuous substrate bias conditions

Author keywords

Amorphous hydrogenated carbon; Bias growth; Hardness; Plasma CVD

Indexed keywords

ADHESION; CARBON; ELECTRIC POTENTIAL; FILM GROWTH; HARDNESS; HYDROGENATION; ION BOMBARDMENT; METHANE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES;

EID: 18444391259     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2004.10.016     Document Type: Conference Paper
Times cited : (8)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.