Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating

Journal of Synchrotron Radiation

Volumn 15, Issue 2, 2008, Pages 170-175

  Chen, Y T ^a,b   Lo, T N ^a   Chiu, C W ^a   Wang, J Y ^a   Wang, C L ^a   Liu, C J ^a   Wu, S R ^a,c   Jeng, S T ^a,d   Yang, C C ^a,d   Shiue, J ^a   Chen, C H ^a   Hwu, Y ^a,c,d,e   Yin, G C ^e   Lin, H M ^b   Je, J H ^f   Margaritondo, G ^g  

^a INSTITUTE OF PHYSICS   (Taiwan)

^b TATUNG UNIVERSITY   (Taiwan)

^c NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^d NATIONAL TAIWAN OCEAN UNIVERSITY   (Taiwan)

^e NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^f Pohang University of Science and Technology (POSTECH)   (South Korea)

^g EPFL   (Switzerland)

Author keywords

E beam lithography; Electrodeposition; Fresnel zone plate; Nanofabrication; X ray microscope

Indexed keywords

ASPECT RATIO; ELECTROPLATING; KETONES; NANOSTRUCTURES; PHOTORESISTORS;

METHYLISOBUTYLKETONE; X-RAY MICROSCOPE;

ELECTRON BEAM LITHOGRAPHY;

EID: 40049106623     PISSN: 09090495     EISSN: 16005775     Source Type: Journal    
DOI: 10.1107/S0909049507063510     Document Type: Article

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