|
|
|
Volumn 13, Issue 1, 1996, Pages 42-53
|
|
Electron-beam resist technology for GaAs microwave device fabrication
a
a
NONE
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
ALCOHOLS;
ELECTRODES;
ELECTRON BEAM LITHOGRAPHY;
GATES (TRANSISTOR);
HIGH ELECTRON MOBILITY TRANSISTORS;
MONOLITHIC MICROWAVE INTEGRATED CIRCUITS;
POLYMERS;
SATELLITE COMMUNICATION SYSTEMS;
SEMICONDUCTING GALLIUM ARSENIDE;
TECHNOLOGY;
TRANSISTORS;
WATER;
ELECTRON BEAM RESIST;
LIST OFF METALLIZATION;
METHACRYLATE POLYMER;
INTEGRATED CIRCUIT MANUFACTURE;
|
|
EID: 0029723075
PISSN: 02649187
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
|
Times cited : (8)
|
|
References (9)
|
